Evaporation Machine-FS380

Evaporation machine-FS380

Product Parameters

overall size ≤ 1.1(L)× 0.9(W)× 2(H)(unit: M)

ultimate vacuum ≤ 3 × 10 -5Pa holding pressure for 12 hours ≤ 5P a

film thickness uniformity ≥ 95% repeatability ≥ 95%

substrate size ≤ 32 × 32mm quantity 4 pieces

has 12 mask positions, 3 positions for each substrate

Scope of application

perovskite materials, two-dimensional materials, photovoltaic solar cells and OLED device preparation.

evaporationmachine-FS600

Evaporation Machine-FS600

Product Parameters

overall size ≤ 1.2(L)× 0.9(W)× 2(H)(unit: M)

ultimate vacuum ≤ 2 × 10 -5Pa holding pressure for 12 hours ≤ 5P a

film thickness uniformity ≥ 95% repeatability ≥ 95% rate stability ≥ 95%

Substrate size ≤ 210 × 210mm

can be adapted to electron beam evaporation system

Scope of application

perovskite device development, optoelectronic device structure optimization, etc., compatible with silicon perovskite device production.

evaporation machine-FS500

Evaporation machine-FS500

Product Parameters

overall size ≤ 1.2(L)× 0.9(W)× 2(H)(unit: M)

ultimate vacuum ≤ 2 × 10 -5Pa holding pressure for 12 hours ≤ 5P a

film thickness uniformity ≥ 95% repeatability ≥ 95% rate stability ≥ 95%

Substrate Size ≤ 40 × 40mm Quantity 6 Pieces

≤ 50 × 50mm quantity 4 pieces

has 12 mask positions, 3 positions for each substrate

Scope of application

OLED material verification, optoelectronic device structure optimization, etc.

Evaporation Machine-FS700

Evaporation Machine-FS700

Product Parameters

overall size ≤ 1.9(L)× 1.2(W)× 2.2(H)(unit: M)

ultimate vacuum ≤ 3.5 × 10 -5Pa holding pressure for 12 hours ≤ 5P a

film thickness uniformity ≥ 95% repeatability ≥ 95% rate stability ≥ 95%

Substrate size ≤ 300 × 300mm

can be adapted to electron beam, beam source evaporation system

Scope of application

perovskite device development, optoelectronic device structure optimization, etc., compatible with silicon perovskite device production.

Vaporizer-FS-PSC-300

Vaporizer-FS-PSC-300

Product Parameters

In-line structure, 6 cavities, equipment automation

substrate size 450 mmX325mmx3.2mm (length * width * thickness)

can realize the co-evaporation of 3 source materials, and can expand the line source or point line source according to the process requirements.

Equipment Capacity

32 large pieces/day (8H),256 small pieces/day (8H)(according to C60 at a rate of 1A/s evaporation 200A as an example)